Titanium Clad Copper Flat Bar (Gr2 + C11000/T2) for Electroplating Busbar Applications
The outer layer of Grade 2 titanium provides excellent resistance to corrosive media such as acids, chlorides, and electrolytes, while the copper core ensures high electrical conductivity and efficient current distribution.
Material Structure:
Cladding Layer: Gr2 Titanium (ASTM B265)
Core Material: C11000 / T2 Copper (high conductivity ≥ 99.9%)
This metallurgical bonded structure ensures stable performance under long-term operation in aggressive environments.
Technical Advantages:
Corrosion resistance in electroplating solutions and chemical media
Low electrical resistance and high current carrying capacity
Strong bonding strength between titanium and copper layers
Reduced maintenance cost compared with solid titanium materials
Improved service life in continuous electrolysis processes
Typical Applications:
Electroplating anode busbars
Cathode conductive bars
Electrolytic cell connectors
PCB plating lines
Anodizing systems
Chlor-alkali and surface treatment industries
Product Condition (Current Shipment):
Flat bar, straight length
No drilling holes or machining
No titanium end sealing
Surface protected with plastic wrapping
This standard supply condition allows flexibility for further machining according to customer specific requirements.
Optional Processing Capabilities:
CNC drilling and threading
Titanium end sealing (explosion welding or sealing process)
Cutting, bending, and fabrication
Customized dimensions based on drawings
Titanium clad copper (Gr2 + C11000/T2) is widely recognized as an optimal solution for electroplating equipment manufacturers and end users requiring both durability and conductivity.
For technical data, drawings, or application support, please feel free to contact us.
+86-731-82224155
8613272400394
enquiry@jetvisiontitanium.com